ald-process-controller

# ALD Process Controller ## Purpose The ALD Process Controller skill provides comprehensive atomic layer deposition process control, enabling conformal thin film growth with atomic-level precision through optimized pulse sequences and in-situ monitoring. ## Capabilities - Precursor pulse/purge optimization - Growth per cycle (GPC) characterization - Film uniformity mapping - Conformality assessment - In-situ monitoring integration - Multi-component film design ## Usage Guidelines ### ALD Process Control 1. **Saturation Studies** - Vary pulse times - Identify saturation dose - Optimize purge times 2. **Process Window** - Determine ALD window - Optimize temperature - Monitor GPC stability 3. **Film Quality** - Characterize uniformity - Measure conformality - Assess impurity levels ## Process Integration - Thin Film Deposition Process Optimization - Nanodevice Integration Process Flow ## Input Schema ```json { "material": "string", "precursor_a": "string", "precursor_b": "string", "target_thickness": "number (nm)", "substrate": "string", "temperature": "number (C)" } ``` ## Output Schema ```json { "optimized_recipe": { "precursor_a_pulse": "number (s)", "purge_a": "number (s)", "precursor_b_pulse": "number (s)", "purge_b": "number (s)" }, "gpc": "number (Angstrom/cycle)", "cycles_required": "number", "uniformity": "number (%)", "conformality": "number (% step coverage)" } ```