cvd-pvd-process-controller

# CVD-PVD Process Controller ## Purpose The CVD-PVD Process Controller skill provides comprehensive vapor deposition process control for thin film and nanostructure fabrication, enabling optimized growth conditions for various material systems. ## Capabilities - CVD precursor chemistry selection - Temperature and pressure optimization - Plasma-enhanced CVD protocols - PVD sputtering/evaporation control - Film stress management - Rate and uniformity optimization ## Usage Guidelines ### Deposition Process Control 1. **CVD Optimization** - Select precursor chemistry - Optimize flow rates - Control temperature profile 2. **PVD Control** - Optimize sputter power - Control deposition rate - Manage film stress 3. **Quality Assurance** - Monitor thickness in-situ - Characterize composition - Verify stoichiometry ## Process Integration - Thin Film Deposition Process Optimization - Nanodevice Integration Process Flow ## Input Schema ```json { "deposition_type": "cvd|pecvd|sputtering|evaporation", "material": "string", "target_thickness": "number (nm)", "substrate": "string", "quality_requirements": { "uniformity": "number (%)", "stress": "string (tensile|compressive|neutral)" } } ``` ## Output Schema ```json { "process_parameters": { "temperature": "number (C)", "pressure": "number (mTorr)", "power": "number (W)", "gas_flows": [{"gas": "string", "flow": "number (sccm)"}] }, "deposition_rate": "number (n...