ebl-process-controller

# EBL Process Controller ## Purpose The EBL Process Controller skill provides comprehensive electron beam lithography process control, enabling high-resolution nanopatterning through dose optimization, proximity effect correction, and critical dimension control. ## Capabilities - Pattern design and fracturing - Dose optimization and modulation - Proximity effect correction (PEC) - Alignment and overlay control - Resist processing optimization - Critical dimension (CD) control ## Usage Guidelines ### EBL Process Control 1. **Pattern Preparation** - Design in CAD software - Fracture into write fields - Apply beam step size 2. **Dose Optimization** - Run dose matrices - Apply PEC algorithms - Account for pattern density 3. **Process Integration** - Optimize resist thickness - Control development conditions - Verify feature dimensions ## Process Integration - Nanolithography Process Development - Nanodevice Integration Process Flow ## Input Schema ```json { "pattern_file": "string", "resist": "string", "thickness": "number (nm)", "target_cd": "number (nm)", "beam_voltage": "number (kV)", "beam_current": "number (pA)" } ``` ## Output Schema ```json { "optimized_dose": "number (uC/cm2)", "pec_parameters": { "alpha": "number", "beta": "number", "eta": "number" }, "write_time": "number (hours)", "expected_cd": "number (nm)", "cd_uniformity": "number (3sigma)" } ```