nanoimprint-process-controller

# Nanoimprint Process Controller ## Purpose The Nanoimprint Process Controller skill provides comprehensive nanoimprint lithography process control, enabling high-throughput nanopatterning through template design, imprint optimization, and defect management. ## Capabilities - Template design and fabrication - Imprint pressure and temperature optimization - UV-NIL and thermal NIL protocols - Demolding force analysis - Residual layer control - Defect inspection and yield analysis ## Usage Guidelines ### NIL Process Control 1. **Template Preparation** - Design with demolding in mind - Apply anti-sticking treatment - Verify pattern fidelity 2. **Imprint Optimization** - Optimize pressure and temperature - Control residual layer thickness - Minimize defects 3. **Yield Improvement** - Track defect types - Optimize demolding conditions - Implement cleaning protocols ## Process Integration - Nanolithography Process Development - Directed Self-Assembly Process Development ## Input Schema ```json { "template_id": "string", "resist_type": "thermal|uv_curable", "target_features": { "min_cd": "number (nm)", "pitch": "number (nm)", "aspect_ratio": "number" }, "substrate": "string" } ``` ## Output Schema ```json { "process_parameters": { "temperature": "number (C)", "pressure": "number (bar)", "time": "number (s)", "uv_dose": "number (mJ/cm2)" }, "residual_layer": "number (nm)", "demolding_force": "numbe...